Req. ID: 119504 


As a Chemical Mechanical Planarization (CMP) Process Development Engineer at Micron Technology in Boise, you will be an integral part of a cutting-edge Technology Development (R&D) organization.  You will collaborate with diverse teams across the company to develop new processes for next-generation semiconductor devices.  Your critical thinking and analytical skills will be challenged while you perform rigorous process characterization, develop new consumables, evaluate new hardware, and complete ground-breaking research.  Your innovative thinking may lead to the next big invention to be added to Micron’s massive patent portfolio.  Come join us as we define the future of the semiconductor industry.


Desired candidate profile:

  • Hands-on experience with CMP polishing equipment, which includes familiarity with equipment operation, optical metrology, profilometry, common polishing slurries, and polishing pads.
  • In-depth understanding of polishing mechanisms for dielectric and metal CMP.
  • Knowledge of material properties and characterization techniques.
  • Strong aptitude for research and development with interest and capability to create production worthy technologies, able to research and stay abreast with the published literature in CMP technology.
  • Proactive approach to problem/project management and good problem-solving skills.
  • Drive continuous process and productivity improvements to meet the Quality and Cycle time needs of Process Integration and Manufacturing, set process roadmaps.
  • Ability to direct and manage CMP consumables and equipment vendors.
  • Demonstrate dependability and willingness to take on responsibilities.
  • The ability to work on multiple projects and work through cross-disciplinary and cross-organizational logistical issues effectively and efficiently.
  • The ability to effectively organize, prioritize, and manage time and projects.
  • Strong teamwork skills.
  • Strong communication skills (written, verbal and presentation)
  • Strong attention to details.


Education and Experience:

BS (w/ CMP experience) / MS / PhD in chemical engineering, chemistry, material science, electrical engineering or a related field.  Experience in CMP is not required although considered to be a benefit.

We recruit, hire, train, promote, discipline and provide other conditions of employment without regard to a person's race, color, religion, sex, age, national origin, disability, sexual orientation, gender identity and expression, pregnancy, veteran’s status, or other classifications protected under law.  This includes providing reasonable accommodation for team members' disabilities or religious beliefs and practices.

Each manager, supervisor and team member is responsible for carrying out this policy. The EEO Administrator in Human Resources is responsible for administration of this policy. The administrator will monitor compliance and is available to answer any questions on EEO matters.

To request assistance with the application process, please contact Micron’s Human Resources Department at 1-800-336-8918 (or 208-368-4748).

Keywords:  Boise || Idaho (US-ID) || United States (US) || Technology Development || Experienced || Regular || Engineering || #LI-MT1 ||

Full time
Boise, ID 83701, US